Synchrotron light as a source for extreme ultraviolet lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 6, 1999, Pages 3043-3046

  Ockwell, D C ^a   Crosland, N C E ^a   Kempson, V C ^a  

^a OXFORD INSTRUMENTS PLASMA TECHNOLOGY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038930661     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590951     Document Type: Article

References (4)

1. X-Ray Data Booklet, edited by D. Vaughan (Lawrence Berkeley Laboratory, 1986).
2. G. Lesoigne and J. Leavey, Solid State Technol. (July 1998).
3. J. P. Silverman, J. Vac. Sci. Technol. B 16, 3137 (1998).
4. C. W. Gwynn et al., "Extreme Ultra-violet Lithography - A White Paper," EUV LLC, November 1998.