Studying early time HWCVD growth of a-Si:H by real time spectroscopic ellipsometry

Thin Solid Films

Volumn 430, Issue 1-2, 2003, Pages 20-23

  Levi, Dean ^a   Nelson, Brent P ^a   Reedy, Robert ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

Hot wire deposition; Hydrogenated amorphous silicon; In situ; Spectroscopic ellipsometry

Indexed keywords

DIFFUSION; ELLIPSOMETRY; FILM GROWTH; SECONDARY ION MASS SPECTROMETRY; SUBSTRATES; THIN FILMS;

HOT-WIRE DEPOSITION;

AMORPHOUS SILICON;

EID: 0038823903     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00123-8     Document Type: Conference Paper

References (6)

1. Ferlauto A.S., Ferreira G.M., Chen C., Rovira P.I., Wronski C.R., Collins R.W., Deng X., Ganguly G. McConnell R.D., Kapur V.K. Photovoltaics for the 21st Century vol. 2. 2001;199 The Electrochemical Society.
2. D.H. Levi, B.P. Nelson, J.D. Perkins, in: J. David Cohen, J.R. Abelson, H. Matsumura, J. Robertson (Eds.), Amorphous and Heterogeneous Silicon-Based Films, San Francisco, USA, April 2-5, 2002, Mater. Res. Soc. Symp. Proc. 715 (2002) 153.
3. B.P. Nelson, D.H. Levi, in: J. David Cohen, J.R. Abelson, H. Matsumura, J. Robertson (Eds.), Amorphous and Heterogeneous Silicon-Based Films, San Francisco, USA, April 2-5, 2002, Mater. Res. Soc. Symp. Proc. 715 (2002) 159.
4. D.H. Levi, B.P. Nelson, J.D. Perkins, H.R. Moutinho, Proceedings of the 29th IEEE Photovoltaic Specialists Conference, New Orleans, LA, May 2002, p. 1146.
5. Cody G.D. Pankove J.I. Semiconductors and Semimetals, vol. 21, Part B. 1984;11 Academic Press, New York.
6. Feng G.F., Katiyar M., Abelson J.R., Maley N. Phys. Rev. B. 45:(16):1992;9103.