Ultrathin nickel oxide films grown on Ag(0 0 1): A study by XPS, LEIS and LEED intensity analysis

Surface Science

Volumn 531, Issue 3, 2003, Pages 368-374

  Caffio, M ^a   Cortigiani, B ^a   Rovida, G ^a   Atrei, A ^b   Giovanardi, C ^c   Di Bona, A ^c   Valeri, S ^c,d  

^a UNIVERSITY OF FLORENCE   (Italy)

^b UNIVERSITY OF SIENA   (Italy)

^c INFM   (Italy)

^d UNIVERSITY OF MODENA AND REGGIO EMILIA   (Italy)

Author keywords

Epitaxy; Growth; Low energy electron diffraction (LEED); Nickel oxides; Silver; Surface structure, morphology, roughness, and topography

Indexed keywords

EPITAXIAL GROWTH; LOW ENERGY ELECTRON DIFFRACTION; SILVER; SURFACE ROUGHNESS; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERLAYER DISTANCE;

NICKEL COMPOUNDS;

EID: 0038812054     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(03)00544-2     Document Type: Article

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