Improving the process capability of SU-8, part III

Journal of Photopolymer Science and Technology

Volumn 15, Issue 5, 2002, Pages 749-756

  Johnson, D W ^a   Nawrocki, D J ^a   Ruhmann, R ^b  

^a MicroChem Corp   (United States)

^b MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

Epoxy resist reproducibility; Photoacid generators; SU 8 resist

Indexed keywords

METAL ION; SULFONIUM DERIVATIVE;

ARTICLE; CHEMICAL COMPOSITION; DEVICE; LITHOGRAPHY; PHOTOCHEMISTRY; SEMICONDUCTOR; TECHNIQUE;

EID: 0038795084     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.15.749     Document Type: Article

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3. H Lorenz, et al., J. Micromech. Microeng. 7 (1997) 121.
4. M. Despont, et al., MEMS (1997) 518-522.
5. Ruhmann, R., et al., Proc. SPIE, 4345 (2001) 502.
6. US Pat. 5,102,772, Apr. 7, 1992.