Direct plating of electroless Ni-P layers on sputter-deposited Al-Ni alloy films

Journal of the Electrochemical Society

Volumn 150, Issue 7, 2003, Pages

  Azumi, Kazuhisa ^a   Yugiri, Takuma ^a   Kurihara, Toshiyuki ^a   Seo, Masahiro ^a   Habazaki, Hiroki ^b   Fujimoto, Shinji ^b  

^a HOKKAIDO UNIVERSITY   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; DISSOLUTION; ELECTROLESS PLATING; FLUORESCENCE; ION BEAM ASSISTED DEPOSITION; MAGNETRON SPUTTERING; NICKEL ALLOYS; NUCLEATION; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

ALUMINUM NICKEL ALLOYS; NICKEL PHOSPHIDE LAYERS; NONUNIFORM PLATING LAYER;

ALUMINUM ALLOYS;

EID: 0038783361     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1576770     Document Type: Article

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