Voltage-influence of biased interconnection line on integrated circuit-internal current contrast measurements via magnetic force microscopy

Microelectronics Reliability

Volumn 40, Issue 8-10, 2000, Pages 1389-1394

  Weber, R ^a   Mertin, W ^a   Kubalek, E ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038705935     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(00)00158-X     Document Type: Article

References (4)

1. A. Campbell et al. Internal current probing of integrated circuits using magnetic force microscopy, Proc. of International Reliability Physics Symposium (1993), 168-177
2. D. Sarid, Scanning Force Microscopy, Oxford University Press, 1991
3. V. Wittpahl et al., Cantilever influence suppression of contactless IC-testing by electric force microscopy, Microelectronics Reliability 38 (1998), 981-986
4. U. Behnke et al., Voltage contrast measurement on sub-micrometer structures with an electric force microscope based test system, Microelectronics Reliability 39 (1999), 969-974