Voltage contrast measurements on sub-micrometer structures with an electric force microscope based test system

Microelectronics Reliability

Volumn 39, Issue 6-7, 1999, Pages 969-974

  Behnke, U ^a   Wand, B ^a   Mertin, W ^a   Kubalek, E ^a  

^a UNIVERSITY OF DUISBURG ESSEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

FAILURE ANALYSIS; INTEGRATED CIRCUIT TESTING; INTERCONNECTION NETWORKS; MICROSCOPES; SEMICONDUCTING SILICON; SENSITIVITY ANALYSIS;

ELECTRIC FORCE MICROSCOPY; SUBMICROMETER STRUCTURES; VOLTAGE CONTRAST MEASUREMENTS;

VOLTAGE MEASUREMENT;

EID: 0033145299     PISSN: 00262714     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0026-2714(99)00132-8     Document Type: Article

References (5)

1. J. T. L. Thong (ed.), Electron Beam Testing Technology, (Plenum Press, 1993)
2. M. Schöttler, H. D. Storzer, and E. Kubalek, Calculation of the influence of electric fields on primary and secondary electrons in electron beam testing of submicron structures, Micoelectron. Eng. 16 (1992) 497-504
3. D. Sarid, Scanning Force Microscopy, Oxford University Press, 1991
4. C. Böhm, F. Saurenbach, P. Taschner, C. Roths, and E. Kubalek, Voltage contrast in integrated circuits with 100 nm spatial resolution by scanning force microscopy, J. Phys. D: Appl. Phys. 26 (1993) 1801-1805
5. J. Bangert and E. Kubalek, Circuit internal logic analysis with Electric Force Microscope-(EFM-) testing, Microelectronics Reliability 38 (1998) 951-956