Experimental study of the oxidation of silicon germanium alloys

Journal of Applied Physics

Volumn 93, Issue 8, 2003, Pages 4896-4901

  Kilpatrick, S J ^a   Jaccodine, R J ^b   Thompson, P E ^c  

^a IBM MICROELECTRONICS   (United States)

^b Lehigh University   (United States)

^c NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; ANNEALING; COMPOSITION; EPITAXIAL GROWTH; INTERFACES (MATERIALS); OXIDATION; X RAY SPECTROSCOPY;

MIXED OXIDE INTERFACES;

SILICON ALLOYS;

EID: 0038680492     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1559944     Document Type: Article

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