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Volumn 426-432, Issue 3, 2003, Pages 2473-2478

On production of nanocrystalline ternary nitride coatings via magnetron sputtering

Author keywords

Deposition bias voltage; Deposition nitrogen pressure; Magnetron sputtering; Nanocrystalline coatings

Indexed keywords

ELECTRIC POTENTIAL; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; MICROHARDNESS; NANOSTRUCTURED MATERIALS; NITROGEN; SUBSTRATES; SURFACE ROUGHNESS; TERNARY SYSTEMS;

EID: 0038677460     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.426-432.2473     Document Type: Conference Paper
Times cited : (4)

References (9)
  • 9
    • 0038211864 scopus 로고    scopus 로고
    • PhD Thesis, University of Technology Sydney, Australia
    • R. Wuhrer: PhD Thesis, University of Technology Sydney, Australia (2001).
    • (2001)
    • Wuhrer, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.