Full phase-shifting methodology for 65 nm node lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 558-567

  Pierrat, Christophe ^a  

^a SYNOPSYS INC   (United States)

Author keywords

Data conversion; Double exposure; OPC; Phase conflict; Phase shifting mask; PSM; RET

Indexed keywords

INTEGRATED CIRCUIT LAYOUT; PHASE SHIFT; PHOTOLITHOGRAPHY; SCANNING;

DATA CONVERSION;

MASKS;

EID: 0038642140     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467848     Document Type: Conference Paper

References (2)

1. C. Pierrat et al., SPIE vol. 4691, pp. 325-335, 2002.
2. C.M. Wang et al., SPIE vol. 4346, pp. 452-463, 2001.