Next generation lithography mask inspection

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4066, Issue , 2000, Pages 514-522

  Bareket, Noah ^a   Biellak, Steve ^a   Pettibone, Don ^a   Stokowski, Stan ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; INSPECTION; LITHOGRAPHY; QUALITY CONTROL; SUBSTRATES; SURFACE PROPERTIES; SYSTEMS ANALYSIS;

CLEANLINESS; NEXT GENERATION LITHOGRAPHY; PATTERN INSPECTION; SUBSTRATE INSPECTION;

MASKS;

EID: 0033670793     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.392104     Document Type: Conference Paper

References (5)