Fabrication of N-level binary optical elements by use of M mask patterns with N in the range of 2M − 1 + 1 ≤ N ≤ 2M

Applied Optics

Volumn 37, Issue 34, 1998, Pages 8012-8020

  Unno, Yasuyuki ^a  

^a UNIVERSITY OF READING   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038591735     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.37.008012     Document Type: Article

References (15)

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