Point-spread function for binary diffractive lenses fabricated with misaligned masks

Applied Optics

Volumn 37, Issue 16, 1998, Pages 3401-3407

  Unno, Yasuyuki ^a  

^a CANON INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0012452855     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.37.003401     Document Type: Article

References (9)

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3. K. M. Flood and J. M. Finlan, “Multiple phase level computergenerated hologram etched in fused silica, ” in Holographic Optics: Optically and Computer Generated, I. N. Cindrich and S. H. Lee, eds., Proc. SPIE 1052, 91-96 (1989).
4. J. A. Cox, T. Werner, J. Lee, S. Nelson, B. Fritz, and J. Bergstrom, “Diffraction efficiency of binary optical elements, ” in Computer and Optically Formed Holographic Optics, I. N. Cin-drich and S. H. Lee, eds., Proc. SPIE 1211, 116-124 (1990).
5. M. W. Farn and J. W. Goodman, “Effect of VLSI fabrication errors on kinoform efficiency, ” in Computer and Optically Formed Holographic Optics, I. N. Cindrich and S. H. Lee, eds., Proc. SPIE 1211, 125-136 (1990).
6. M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, New York, 1980), Chap. 9.
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8. M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, New York, 1980), Chap. 9.
9. B. Richards and E. Wolf, “Electromagnetic diffraction in optical systems. II. Structure of the image field in an aplanatic system, ” Proc. R. Soc. London Ser. A 253, 358-379 (1959).