Optical and dielectric properties of highly oriented (Zr 0.8, Sn 0.2 )TiO 4 thin films prepared by rf magnetron sputtering

Applied Surface Science

Volumn 214, Issue 1-4, 2003, Pages 136-142

  Cheng, W X ^a   Ding, A L ^a   Qiu, P S ^a   He, X Y ^a   Zheng, X S H ^a  

^a SHANGHAI INSTITUTE OF CERAMICS   (China)

Author keywords

(Zr 0.2 ,Sn 0.8 )TiO 4 (ZST) thin film; Dielectric properties; Optical properties; rf sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIELECTRIC LOSSES; ELLIPSOMETRY; FILM GROWTH; MAGNETRON SPUTTERING; MICROSTRUCTURE; MORPHOLOGY; PERMITTIVITY; SUBSTRATES; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS; ZIRCONIUM COMPOUNDS;

STRUCTURE DISORDERS;

THIN FILMS;

EID: 0038548044     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00269-1     Document Type: Article

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