An assessment of Physical and Electrical Design Rule based Statistical Process Monitoring and Modeling (PEDR-SPMM): For foundry manufacturing line of multiple-product mixed-run

IEEE International Conference on Microelectronic Test Structures

Volumn , Issue , 2002, Pages 55-59

  Doong, Kelvin Yih Yuh ^a,b   Hsieh, Sunnys ^a   Lin, S C ^a   Hung, L J ^a   Wang, Robin J ^a   Shen, Binson ^a   Hisa, J W ^a   Guo, J C ^a   Chen, I C ^a   Young, K L ^a   Hsu, Charles Ching Hsiang ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC VARIABLES MEASUREMENT; PRINCIPAL COMPONENT ANALYSIS; PROCESS CONTROL; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS; STATISTICAL METHODS; TECHNOLOGY;

MODELING COMPLEXITY; PHYSICAL AND ELECTRICAL DESIGN RULE; STATISTICAL PROCESS MONITORING AND MODELING;

SEMICONDUCTOR DEVICE TESTING;

EID: 0038495581     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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