Influence of the substrate doping level on spreading resistance profiling

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 404-407

  Vandervorst, W ^a   Clarysse, T ^a   Smith, H E ^b  

^a IMEC   (Belgium)

^b HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0038462979     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588483     Document Type: Article

References (5)

1. M. Pawlik, J. Vac. Sci. Technol. B 10, 388 (1992).
2. P. A. Schumann and E. E. Gardner, J. Electrochem. Soc. 116 87 (1969).
3. T. Clarysse and W. Vandervorst, J. Vac. Sci. Technol. B 10, 432 (1992).
4. T. Clarysse, W. Vandervorst, and M. Pawlik, J. Vac. Sci. Technol. B 14, 390 (1996).
5. T. Clarysse and W. Vandervorst, J. Vac. Sci. Technol. B 10, 413 (1992).