Sulfur diffusion in cadmium telluride thin films. Part 1: The grain boundary diffusion coefficient

Thin Solid Films

Volumn 431-432, Issue , 2003, Pages 73-77

  Lane, D W ^a   Painter, J D ^a   Cousins, M A ^a   Conibeer, G J ^a   Rogers, K D ^a  

^a CRANFIELD UNIVERSITY   (United Kingdom)

Author keywords

Cadmium telluride; Diffusion; Grain boundary; Sulfur

Indexed keywords

ANNEALING; CADMIUM COMPOUNDS; DIFFUSION; GRAIN BOUNDARIES; POLYCRYSTALLINE MATERIALS; SECONDARY ION MASS SPECTROMETRY; SINGLE CRYSTALS; SULFUR;

DIFFUSION COEFFICIENT;

THIN FILMS;

EID: 0038445391     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00204-9     Document Type: Conference Paper

References (5)

1. Kaur I., Mishin Y., Gust W. Fundamentals of Grain and Interphase Boundary Diffusion. 1995;Wiley, Chichester, UK.
2. Lane D.W., Conibeer G.J., Romani S., Healy M.J.F., Rogers K.D. Nucl. Instrum. Meth. B. 136-138:1998;225.
3. Lane D.W., Conibeer G.J., Wood D.A., Rogers K.D., Capper P., Romani S., Hearne S. J. Crystal Growth. 197:1999;743.
4. McCandless B.E., Englemann M.G., Birkmire R.W. J. Appl. Phys. 89:2001;988.
5. Cousins M.A., Lane D.W., Rogers K.D. Thin Solid films. 431-432:2003;78-83.