Phase composition and crystalline structure of titanium nitride deposited on silicon by an ion-beam assisted deposition technique

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 386-389

  Yokota, Katsuhiro ^a   Nakamura, Kazuhiro ^a   Kasuya, Tomohiko ^a   Ohnishi, Masami ^a  

^a KANSAI UNIVERSITY   (Japan)

Author keywords

IBAD; Phase composition; Preferred orientation; Titanium nitride

Indexed keywords

CRYSTAL GROWTH; CRYSTAL ORIENTATION; ION BEAM ASSISTED DEPOSITION; ION SOURCES; IONIZATION; SILICON;

ION CURRENTS;

TITANIUM NITRIDE;

EID: 0038413730     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00768-7     Document Type: Conference Paper

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