Fabrication of optical waveguides by 2 MeV Ar+ irradiation of germanium-doped flame-hydrolysis deposited silica

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 440-443

  Garcia Blanco S ^a   Kellock, A J ^b   Baglin, J E E ^b   Glidle, A ^a   Cooper, J M ^a   Aitchison, J S ^c   De La Rue, R M ^a  

^a UNIVERSITY OF GLASGOW   (United Kingdom)

^b IBM ALMADEN RESEARCH CENTER   (United States)

^c UNIVERSITY OF TORONTO   (Canada)

Author keywords

Flame hydrolysis; Ion implantation; Refractive index; Silica; Waveguide

Indexed keywords

ACTIVATION ENERGY; ANNEALING; ELECTRON IRRADIATION; ION IMPLANTATION; REFRACTIVE INDEX; SEMICONDUCTOR DOPING; SILICA;

FLAME-HYDROLYSIS DEPOSITION (FHD);

OPTICAL WAVEGUIDES;

EID: 0038413634     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00789-4     Document Type: Conference Paper

References (14)

1. Garcia Blanco S., Glidle A., Davies J.H., Aitchison J.S., Cooper J.M. Appl. Phys. Lett. 79:2001;2889.
2. Townsend P.D. Vacuum. 51:1998;301.
3. Von Bibra M.L., Roberts A., Dods S.D. Nucl. Instr. and Meth. B. 168:2000;47.
4. Johnson C.M., Thompson T.D., Ridgway M.C., Gurarie V. Nucl. Instr. and Meth. B. 141:1998;629.
5. Kawachi M. Opt. Quant. Electron. 22:1990;391.
6. Skouri E.M., Martin P., Chusseau L., Alibert C., Coriasso C., Campi D., Cacciatore C. Appl. Phys. Lett. 67:1995;3441.
7. Ulrich R., Torge R. Appl. Opt. 12:1973;2901.
8. Townsend P.D., Chandler P.J., Zhang L. Optical Effects of Ion Implantation. 1994;Cambridge University Press, Cambridge.
9. Ziegler J.F., Biersack J.P., Littmark U. The Stopping and Range of Ions in Solids. 1985;Pergamon Press, New York.
10. S. Garcia Blanco, Electron-beam irradiation of germanium-doped flame-hydrolysis silica for the fabrication of direct-written optical waveguides, Ph.D. thesis, University of Glasgow, 2003.
11. Arnold G.W., Battaglin G., Mattei G., Mazzoldi P., Zandolin S. Nucl. Instr. and Meth. B. 166-167:2000;440.
12. EerNisse E.P. J. Appl. Phys. 45:1974;167.
13. Primak W. J. Appl. Phys. 39:1968;5651.
14. Piao F., Oldham W.G., Haller E.E. J. Vac. Sci. Technol. B. 16:1998;3419.