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Volumn 429, Issue 1-2, 2003, Pages 28-33

Preparation and characterization of amorphous GaF3 and GaF3-BaF2 thin films by ECR microwave plasma-enhanced CVD

Author keywords

Amorphous materials; CVD; Fluorides; Optical waveguides

Indexed keywords

AMORPHOUS MATERIALS; ELECTRON CYCLOTRON RESONANCE; FILM PREPARATION; GALLIUM COMPOUNDS; LIGHT PROPAGATION; OPTICAL WAVEGUIDES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SINGLE CRYSTALS;

EID: 0038374890     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01096-9     Document Type: Article
Times cited : (2)

References (26)
  • 24
    • 0037538978 scopus 로고    scopus 로고
    • Ph.D. Thesis, Kobe University, in Japanese
    • A. Konishi, Ph.D. Thesis, Kobe University, 1997 (in Japanese).
    • (1997)
    • Konishi, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.