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Volumn 42, Issue 3 B, 2003, Pages
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T4 site adsorption of Tl atoms in a Si(111)-(1 × 1)-Tl structure, determined by low-energy electron diffraction analysis
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Author keywords
Adsorption site; Group 13 metals; Low energy electron diffraction; Si(111); Surface silicides; Surface structure determination; Thallium
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Indexed keywords
ADSORPTION;
ANNEALING;
LOW ENERGY ELECTRON DIFFRACTION;
SCANNING TUNNELING MICROSCOPY;
SURFACE STRUCTURE;
SURFACES;
THALLIUM;
ATOM DEPOSITION;
MONOVALENT;
SITE ADSORPTION;
SEMICONDUCTING SILICON;
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EID: 0038361009
PISSN: 00214922
EISSN: None
Source Type: Journal
DOI: 10.1143/jjap.42.l319 Document Type: Letter |
Times cited : (44)
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References (13)
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