Fabrication of multilevel silicon structures by anisotropic deep silicon etching

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 410-416

  Huber, R ^a   Conrad, J ^a   Schmitt, L ^a   Hecker, K ^a   Scheurer, J ^a   Weber, M ^a  

^a INSTITUT FÜR MIKROTECHNIK MAINZ GMBH   (Germany)

Author keywords

Advanced silicon etching; Microfluidics; Multilevel structure; Si LiGA

Indexed keywords

ANISOTROPY; CRYSTAL ORIENTATION; FABRICATION; FLUIDICS; SILICON SENSORS; SURFACE ROUGHNESS;

MICROFLUIDICS;

REACTIVE ION ETCHING;

EID: 0038358325     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00097-2     Document Type: Conference Paper

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