Characterisation of adaptive optic pyramid wavefront sensors fabricated by deep X-ray lithography

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 566-573

  Perennes F ^a   Ghigo, M ^b   Cabrini, S ^a  

^a SINCROTRONE TRIESTE   (Italy)

^b INAF OSSERVATORIO ASTRONOMICO DI BRERA   (Italy)

Author keywords

Adaptive optics; Deep X ray lithography; Pyramid wavefront sensor

Indexed keywords

ADAPTIVE OPTICS; POLISHING; PRISMS; TELESCOPES; WAVEFRONTS; X RAY LITHOGRAPHY;

PYRAMID WAVEFRONT SENSORS;

SENSORS;

EID: 0038358317     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00115-1     Document Type: Conference Paper

References (6)

1. Ragazzoni R. J. Mod. Opt. 43:1996;289-293.
2. Becker E.W., Ehrfeld W., Hagmann P., Maner A., Münchmeyer D. Microelectron. Eng. 4:1986;35-56.
3. Pérennès F., De Bona F., Pantenburg F.J. Nucl. Instr. Methods A. 467/468:2001;1274-1278.
4. Ragazzoni R., Baruffolo A., Farinato J., Ghedina A., Marchetti E., Esposito S., Fini L., Ranfagni P., Bortoletto F., D'Alessandro M., Ghigo M., Crimi G. Proc. SPIE. 4007:2000;57-62.
5. Ragazzoni R., Ghedina A., Baruffolo A., Marchetti E., Farinato J., Niero T., Crimi G., Ghigo M. Proc. SPIE. 4007:2000;423-430.
6. Feiertag G., Ehrfeld W., Lehr H., Schmidt A., Schmidt M. J. Micromech. Microeng. 7:(4):1997;323-331.