Fabrication of nitrogen included carbon materials using microwave plasma CVD

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 321-323

  Sakamoto, Yukihiro ^a   Takaya, Matsufumi ^a  

^a CHIBA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Carbon nitride; Crystalline; CVD; DLC; Microwave; Plasma

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; INCLUSIONS; METHANE; NITROGEN; SCANNING ELECTRON MICROSCOPY;

REACTION GAS SYSTEMS;

COATINGS;

COATING; FABRICATION; MICROWAVE DRYING; SURFACE TREATMENT; VAPOR DEPOSITION;

EID: 0038347336     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00127-0     Document Type: Article

References (3)

1. Liu A.Y. Cohen M.L. Science 245 1989 841
2. Zheng W.T. Sjostron H. Ivanov I.et al. J. Vac. Sci. Technol. A 14 5 1996 2696
3. Zhang P. Gu Y.S. Chang X.R.et al. Surf. Coat. Technol. 26-265 2000 127