Development of chemical dry etching of MoW gate for large size TFT-LCD manufacturing

SID Conference Record of the International Display Research Conference

Volumn , Issue , 1997, Pages 270-273

  Dohi, Takayoshi ^a   Shibata, Mitsuru ^a   Hirata, Noriyuki ^a   Okajima, Kenji ^a   Sato, Takayuki ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

LIQUID CRYSTAL DISPLAYS; MOLYBDENUM ALLOYS; SEMICONDUCTOR DEVICE MANUFACTURE; SUBSTRATES; THIN FILM TRANSISTORS;

CHEMICAL DRY ETCHING (CDE); MOLYBDENUM TUNGSTEN GATE LINE ETCHING;

DRY ETCHING;

EID: 0031372006     PISSN: 10831312     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (2)