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Volumn 3507, Issue , 1998, Pages 192-200

Investigation of thermalization process in sputtering systems by atomic absorption spectroscopy

Author keywords

Atomic absorption; Deposition rates; Diode lasers; Hollow cathode lamps; Sputtering; Thermalization; Thin film; Titanium; Zirconium

Indexed keywords

ATOMIC SPECTROSCOPY; CATHODES; EVAPORATION; MAGNETRON SPUTTERING; PRESSURE EFFECTS; RESONANCE; SEMICONDUCTOR LASERS; SENSITIVITY ANALYSIS; TITANIUM; ZIRCONIUM;

EID: 0038335021     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.324341     Document Type: Conference Paper
Times cited : (2)

References (10)
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    • Atomic line profiles in hollow cathode lamps and a glow discharge atomizer determined by Fourier transform spectroscopy
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  • 10
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.