A semiconductor nano-patterning approach using AFM-scratching through oxide thin layers

Materials Research Society Symposium - Proceedings

Volumn 740, Issue , 2002, Pages 205-210

  Santinacci, L ^a,b,c   Djenizian, T ^a   Schmuki, P ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b EPFL   (Switzerland)

^c CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROCHEMISTRY; MASKS; OXIDES; SEMICONDUCTOR MATERIALS; SILICON; SUBSTRATES;

THIN LAYERS;

NANOTECHNOLOGY;

EID: 0038237940     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-740-i7.8     Document Type: Conference Paper

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