Fabrication of vertically aligned carbon nanostructures by microwave plasma-enhanced chemical vapor deposition

Diamond and Related Materials

Volumn 12, Issue 3-7, 2003, Pages 786-789

  Hiramatsu, M ^a   Ito, K ^a   Lau, C H ^b   Foord, J S ^b   Hori, M ^c  

^a MEIJO UNIVERSITY   (Japan)

^b UNIVERSITY OF OXFORD   (United Kingdom)

^c NAGOYA UNIVERSITY   (Japan)

Author keywords

Field emission; Nanostructures; Plasma enhanced chemical vapor deposition

Indexed keywords

CARBON; CATALYSIS; CHEMICAL VAPOR DEPOSITION; MICROWAVES; SUBSTRATES;

FIELD EMISSION;

NANOSTRUCTURED MATERIALS;

DIAMOND;

EID: 0038184081     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(03)00028-1     Document Type: Article

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