Effects of fluorine incorporation on the properties of amorphous carbon/p-type crystalline silicon heterojunction diodes

Journal of Non-Crystalline Solids

Volumn 321, Issue 3, 2003, Pages 175-182

  Valentini, L ^b   Salerni, V ^b   Armentano, I ^b   Kenny, J M ^a   Lozzi, L ^b   Santucci, S ^b  

^a UNIVERSITY OF PERUGIA   (Italy)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CARBON; CURRENT VOLTAGE CHARACTERISTICS; ELLIPSOMETRY; HEAT TREATMENT; PHOTOVOLTAIC CELLS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; ULTRAVIOLET SPECTROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTOVOLATIC PROPERTIES;

HETEROJUNCTIONS;

EID: 0038176537     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(03)00181-9     Document Type: Article

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