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Volumn , Issue , 2003, Pages 145-148
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200 GHz fmax, fτ InP/In0.53Ga0.47As/InP metamorphic Double Heterojunction Bipolar Transistors on GaAs substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
CRYSTAL LATTICES;
ELECTRIC BREAKDOWN;
ELECTRIC RESISTANCE;
ETCHING;
LEAKAGE CURRENTS;
MOLECULAR BEAM EPITAXY;
OHMIC CONTACTS;
PHOTOLITHOGRAPHY;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
SEMICONDUCTING INDIUM GALLIUM ARSENIDE;
SEMICONDUCTING INDIUM PHOSPHIDE;
THERMAL CONDUCTIVITY;
AMPLIFICATION;
BUFFER LAYERS;
CURRENT DENSITY;
ELECTRIC CURRENT MEASUREMENT;
GALLIUM ALLOYS;
GALLIUM ARSENIDE;
GALLIUM PHOSPHIDE;
HEAT RESISTANCE;
HETEROJUNCTIONS;
INDIUM;
INDIUM PHOSPHIDE;
OPTICAL WAVEGUIDES;
SEMICONDUCTING GALLIUM;
SEMICONDUCTING INDIUM COMPOUNDS;
SUBSTRATES;
LATTICE MATCHED;
METAMORPHIC BUFFER LAYER;
METAMORPHIC DOUBLE HETEROJUNCTION BIPOLAR TRANSISTORS;
OPTICAL PROJECTION LITHOGRAPHY;
WET CHEMICAL ETCHING;
HETEROJUNCTION BIPOLAR TRANSISTORS;
BASE-COLLECTORS;
DC CURRENT GAIN;
DOUBLE HETEROJUNCTION BIPOLAR TRANSISTORS;
HIGH THERMAL CONDUCTIVITY;
HIGH-POWER DEVICES;
METAMORPHIC BUFFER LAYER;
METAMORPHIC BUFFERS;
REVERSE LEAKAGE CURRENT;
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EID: 0038148612
PISSN: 10928669
EISSN: None
Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper |
Times cited : (4)
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References (8)
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