TXRF analysis of low Z elements and TXRF-NEXAFS speciation of organic contaminants on silicon wafer surfaces excited by monochromatized undulator radiation

Solid State Phenomena

Volumn 92, Issue , 2003, Pages 165-170

  Beckhoff, B ^a   Fliegauf, R ^a   Ulm, G ^a   Weser, J ^a   Pepponi, G ^b   Streli, C ^b   Wobrauschek, P ^b   Ehmann, T ^c   Fabry, L ^c   Pahlke, S ^c   Kanngiesser B ^d   Malzer, W ^d  

^a PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^b TU WIEN   (Austria)

^c SILTRONIC AG   (Germany)

^d TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

Author keywords

Light elements; NEXAFS; Organic contaminants; Speciation; Synchrotron; TXRF

Indexed keywords

DECOMPOSITION; IMPURITIES; NUMERICAL METHODS; RADIATION EFFECTS; RAMAN SCATTERING; SURFACES; SYNCHROTRON RADIATION; ALUMINUM; DROPS; FLUORESCENCE; MAGNESIUM; NICKEL COMPOUNDS; SYNCHROTRONS; WIGGLERS; X RAY ABSORPTION;

MONOCHROMATIZED UNDULATOR RADIATION; NEAR EDGE X RAY ABSORPTION FINE STRUCTURE; ORGANIC CONTAMINANTS; TOTAL REFLECTION X RAY FLUORESCENCE ANALYSIS; LIGHT ELEMENTS; NEXAFS; ORGANIC CONTAMINANT; SPECIATION; TXRF;

SILICON WAFERS;

EID: 0038068828     PISSN: 10120394     EISSN: None     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/ssp.92.165     Document Type: Conference Paper

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