Preparation of the hard CNX thin films using NO ambient gas by pulsed laser deposition

Science and Technology of Advanced Materials

Volumn 2, Issue 3-4, 2001, Pages 533-537

  Aoqui, Shin Ichi ^a   Ohshima, Tamiko ^b   Ikegami, Tomoaki ^b   Ebihara, Kenji ^b  

^a SOJO UNIVERSITY   (Japan)

^b KUMAMOTO UNIVERSITY   (Japan)

Author keywords

Carbon nitride; CNx; Hardness; N C ratio; PLD; Pulsed laser deposition

Indexed keywords

EID: 0038043921     PISSN: 14686996     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1468-6996(01)00134-6     Document Type: Article

References (7)

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