Useful and cost efficient fabrication of dot arrays for photonic crystals by direct write electron-beam lithography

Microelectronic Engineering

Volumn 67-68, Issue , 2003, Pages 157-161

  Steingruber R ^a   Golka, S ^a   Heidrich, H ^a  

^a FRAUNHOFER HEINRICH HERTZ INSTITUTE   (Germany)

Author keywords

Direct write electron beam lithography; Dot arrays; Photonic crystals

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; INTEGRATED OPTICS; OPTICAL RESOLVING POWER; QUANTUM OPTICS;

PHOTONIC CRYSTALS;

CRYSTALS;

EID: 0038020994     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00066-2     Document Type: Conference Paper

References (3)

1. Benisty H., Weisbuch C., Labilloy D., Rattier M., Smith C.J.M., Krauss T.F., De La Rue R.M., Houdreé R., Oesterle U., Jouanin C., Cassagne D. J. Lightwave Technol. 17:1999;2063-2077.
2. Djoudi A., Legouézigou L., Hubert S., Sainson S., Moussant C., Chandouineau J.P., Pommereau F., Duan G.-H. Proc. of 14th Indium Phosphide and Related Materials Conf: 2002;429-432.
3. Benisty H., Labilloy D., Weisbuch C., Smith C.J.M., Krauss T.F., Cassagne D., Béraud A., Jouanin C. Appl. Phys. Lett. 76:(5):2000;532-534.