A study on the low temperature coating process by inductively coupled plasma assisted DC magnetron sputtering

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 41-44

  Na, H D ^a   Park, H S ^a   Jung, D H ^a   Lee, G R ^a   Joo, J H ^b   Lee, J J ^a  

^a Seoul National University   (South Korea)

^b Kunsan National University   (South Korea)

Author keywords

Color; Decorative; Inductively coupled plasma sputtering; Roughness; Titanium nitride

Indexed keywords

COOLING; INDUCTIVELY COUPLED PLASMA; MAGNETRON SPUTTERING; PHYSICAL VAPOR DEPOSITION; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASTICS; TITANIUM NITRIDE;

HIGH-DENSITY PLASMA TECHNIQUE;

COATINGS;

COATING; PLASMA TREATMENT; SPUTTERING; SURFACE TREATMENT; TEMPERATURE EFFECT;

EID: 0038009278     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00071-9     Document Type: Article

References (9)

1. Rossnagel S.M. Hopwood J. Appl. Phys. Lett. 63 1993 3285
2. Hopwood J. Phys. Plasmas 5 5 1998 1624
3. Tanaka Y. Kim E. Forster J. Xu Z. J. Vac. Sci. Technol. B 17 1999 416
4. Konig U. Tabersky R. van den Berg H. Surf. Coat. Technol. 50 1991 57
5. Lim J.W. Park H.S. Park T.H. Lee J.J. Joo J.H. J. Vac. Sci. Technol. A 18 2000 524
6. Park H.S. Jung D.H. Na H.D. Joo J.H. Lee J.J. Surf. Coat. Technol. 142-144 2001 999
7. Nah J.W. Kim B.J. Lee D.K. Lee J.J. J. Vac. Sci. Technol. A 17 1999 463
8. H.S. Park, Ph.D. Thesis, Seoul National University (2001)
9. Hopwood J. Qian F. J. Appl. Phys. 78 2 1995 758