Improvement of c-axis preferred orientation of CoCr-based thin film with amorphous Si underlayer

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 532-535

  Kim, Yong Jin ^a   Park, Won Hyo ^a   Kong, Sok Hyun ^b   Nakagawa, Shigeki ^b   Kim, Kyung Hwan ^a  

^a Gachon University College of Medicine   (South Korea)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous Si; C axis preferred orientation; Co Cr( Ta) thin film; Facing targets sputtering apparatus; Perpendicular magnetic recording

Indexed keywords

AMORPHOUS SILICON; COBALT COMPOUNDS; CRYSTALLOGRAPHY; DEPOSITION; MAGNETIC RECORDING;

MAGNETIC LAYERS;

THIN FILMS;

CHROMIUM; COBALT; FILM; SPUTTERING;

EID: 0038009196     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00192-0     Document Type: Article

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