Thermo- and photo-sensitive GeO2-B2O3-SiO2 thin glass films

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 2 A, 2003, Pages 559-563

  Nishiyama, Hiroaki ^a,b   Kintaka, Kenji ^a   Nishii, Junji ^a   Sano, Tomokazu ^b   Ohmura, Etuji ^b   Miyamoto, Isamu ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

Grating; Oxide glass; PECVD; Refractive index change; Thermal annealing

Indexed keywords

BORON COMPOUNDS; DIFFRACTION; DIFFRACTION GRATINGS; EXCIMER LASERS; GERMANIUM COMPOUNDS; GLASS; IRRADIATION; PHOTOSENSITIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; THERMODYNAMIC PROPERTIES; THIN FILMS;

BRAGG GRATINGS; DIFFRACTION EFFICIENCY; THERMOSENSITIVITY;

OXIDES;

EID: 0038005529     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.559     Document Type: Article

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