Magnetic and Mössbauer study of Fe/Si multilayers

Journal of Applied Physics

Volumn 93, Issue 10 2, 2003, Pages 6501-6503

  Lucinski T ^a,b   Kopcewicza, M ^c   Hutten A ^b   Bruckl H ^b   Heitmann, S ^b   Hempel, T ^b   Reiss, G ^b  

^a INSTITUTE OF MOLECULAR PHYSICS   (Poland)

^b BIELEFELD UNIVERSITY   (Germany)

^c Department of Micro and Nanotechnology of Wide Bandgap Semiconductors   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIFERROMAGNETISM; CRYSTAL STRUCTURE; INTERFACES (MATERIALS); MAGNETIC MOMENTS; MAGNETIC PROPERTIES; MAGNETIZATION; MOSSBAUER SPECTROSCOPY; STOICHIOMETRY;

ANTIFERROMAGNETIC COUPLING;

MULTILAYERS;

EID: 0037977851     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1558656     Document Type: Conference Paper

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