Application of chromeless phase lithography (CPL) masks in ArF lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 2, 2002, Pages 1189-1201

  Kasprowicz, Bryan S ^a   Progler, Christopher J ^a   Wu, Wei ^b   Conley, Will ^b   Litt, Lloyd C ^b   Van Den Broeke, Doug ^c   Wampler, Kurt E ^c   Socha, Robert ^c  

^a PHOTRONICS INC   (United States)

^b MOTOROLA INC   (United States)

^c ASML US Inc   (United States)

Author keywords

Chromeless mask; Chromeless Phase Lithography; CPL; High transmission attenuated PSM; PSM; PSM manufacturing

Indexed keywords

IMAGING TECHNIQUES; LIGHTING; MASKS; PHASE SHIFT;

CHROMELESS PHASE LITHOGRAPHY;

LITHOGRAPHY;

EID: 0037965789     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.468107     Document Type: Conference Paper

References (7)

1. Wantanabe et al. "Sub-Quarter-Micron Gate Pattern Fabrication using a Transparent Phase Shift Mask", JVS Technology B9(6), Nov/Dec 1991.
2. Toh et al., "Optical Lithography with Chromeless Phase-Shifted Masks", SPIE, vol. 1643, pp. 207-217, 1991.
3. Fritze et al. "Applications of Chromeless Phase-Shifting Masks to sub-100nm SOI CMOS Transistor Fabrication", SPIE, vol. 4000, pp. 388-407, 2000.
4. Patterson et al., "Effect f Quartz Phase Etch on 193nm Alternating Phase Shift Mask Performance for the 100nm Node", SPIE, vol. 4691, pp. 1033-1040, 2002.
5. Karklin et al., "Automatic Defect Severity Scoring for 193nm Reticle Defect Inspection", SPIE, vol. 4346, pp. 898-906, 2001.
6. Chen et al., "System and Method of providing optical proximity correction for features using phase shifted halftone transparent/semi-transparent features," US Patent 6335130 B1.
7. Van Den Broeke et. al., "Complex 2D Pattern Lithography at λ/4 Resolution Lithography using Chromeless Phase Lithography (CPL), SPIE vol. 4691, pp. 196-214, 2002.