Preparation of conductive LaNiO3 film electrodes by a simple chemical solution deposition technique for integrated ferroelectric thin film devices

Journal of Physics D: Applied Physics

Volumn 36, Issue 10, 2003, Pages 1217-1221

  Bao, Dinghua ^a   Yao, Xi ^b   Wakiya, Naoki ^a   Shinozaki, Kazuo ^a   Mizutani, Nobuyasu ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONDUCTIVE FILMS; CRYSTAL GROWTH; DIFFERENTIAL THERMAL ANALYSIS; ELECTRIC VARIABLES MEASUREMENT; ELECTRODES; FERROELECTRIC MATERIALS; GRAIN SIZE AND SHAPE; IMPURITIES; THERMOGRAVIMETRIC ANALYSIS; THIN FILM DEVICES;

CHEMICAL SOLUTION DEPOSITION; LANTHANUM NICKEL OXIDE; ROOM TEMPERATURE RESISTIVITY;

LANTHANUM COMPOUNDS;

EID: 0037945520     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/10/311     Document Type: Article

References (12)

1. Cho C R, Payne D A and Cho S L 1997 Appl. Phys. Lett. 71 3013
2. Yang C C, Chen M S, Hong T J, Wu C M, Wu J M and Wu T B 1995 Appl. Phys. Lett. 66 2643-5
3. Sanchez F, Ferrater C, Guerrero C, Garcia-Cuenca M V and Varela M 2000 Appl. Phys. A 71 59.
4. Li A D, Ge C Z, Lu P and Ming N B 1996 Appl. Phys. Lett. 68 1347
5. Bao D, Yao X, Wakiya N, Shinozaki K and Mizutani N 2002 Mater. Sci. Eng. B 94 269
6. Bao D, Wakiya N, Shinozaki K, Mizutani N and Yao X 2001 Appl. Phys. Lett. 78 3286
7. Bao D, Wakiya N, Shinozaki K, Mizutani N and Yao X 2000 J. Appl. Phys. 90 506
8. Ueno K, Sakamoto W, Yogo T and Hirano S 2001 Japan. J. Appl. Phys. 40 6049
9. Ling Y, Ren W, Wu X Q, Zhang L Y and Yao X 1997 Thin Solid Films 311 128
10. Satyalakoshmi K M, Mallya R M, Ramanathan K V, Wu X D, Brinard B, Gautier D C, Vasanthacharya N Y and Hegde M S 1993 Appl. Phys. Lett. 62 1233
11. Ren W, Liu Y, Qiu J H, Zhang L Y and Yao X 1994 Ferroelectrics 152 201
12. Kang S J and Yoon Y S 1997 Japan. J. Appl. Phys. 36 4459