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Volumn 82, Issue 16, 2003, Pages 2688-2690

Composite deposition of Co and Si clusters by rf/dc plasma-gas-codensation

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIFFUSION; ELECTRON DIFFRACTION; GLOW DISCHARGES; PRECIPITATION (CHEMICAL); SILICON; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0037883623     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1569037     Document Type: Article
Times cited : (26)

References (18)
  • 11
    • 3343009680 scopus 로고
    • H. Mori, M. Komatsu, K. Takeda, and H. Fujita, Philos. Mag. Lett. 63, 173 (1991); H. Yasuda and H. Mori, Phys. Rev. Lett. 69, 3747 (1992).
    • (1992) Phys. Rev. Lett. , vol.69 , pp. 3747
    • Yasuda, H.1    Mori, H.2
  • 14
    • 0035883785 scopus 로고    scopus 로고
    • T. J. Konno, S. Yamamuro, and K. Sumiyama, J. Appl. Phys, 90, 3079 (2001); T. J. Konno, S. Yamamuro, and K. Sumiyama, J. Vac. Sci. Technol. B 20, 834 (2001).
    • (2001) J. Appl. Phys , vol.90 , pp. 3079
    • Konno, T.J.1    Yamamuro, S.2    Sumiyama, K.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.