Imaging of 1-nm-thick films with 193-nm microscopy

Optics Letters

Volumn 26, Issue 15, 2001, Pages 1182-1184

  Switkes, M ^a   Rothschild, M ^a   Salvermoser, M ^b  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

^b RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SEMICONDUCTOR PROCESSING;

LIGHT ABSORPTION; LIGHT INTERFERENCE; PLASTIC FILMS; ULTRAVIOLET RADIATION;

LIGHT REFLECTION;

EID: 0037877248     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.26.001182     Document Type: Article

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