Temperature dependence of inward diffusion of underpotentially-deposited Cd into a Au (100) bulk phase under electrochemical environment

Materials Transactions

Volumn 44, Issue 4, 2003, Pages 688-691

  Tanaka, Tomofumi ^a   Kubo, Kimihiko ^a   Hirai, Nobumitsu ^a   Hara, Shigeta ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

Cadmium; Gold; Interface; Inward diffusion; Surface alloy formation; Temperature dependence; Underpotential deposition (UPD); gold cadmium

Indexed keywords

ACTIVATION ENERGY; BINARY ALLOYS; CADMIUM; CHARACTERIZATION; DEFORMATION; DIFFUSION IN SOLIDS; ELECTRODEPOSITION; INTERFACES (MATERIALS); SULFURIC ACID; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

ANODIC VOLTAMMETRY; ELECTROCHEMICAL QUARTZ CRYSTAL MICROBALANCE ANALYSIS; INWARD DEPOSITION; TEMPERATURE DEPENDENCE; UNDERPOTENTIAL DEPOSITION;

GOLD;

EID: 0037867107     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.44.688     Document Type: Article

References (26)

1. T. Vitanov, A. Popov, G. Staikov, E. Bundevski, W. Lorenz and E. Schmidt: Electrochim. Acta 31 (1986) 981-989.
2. A. Popov, N. Dimitrov, O. Velev, T. Vitanov and E. Budevski: Electrochim. Acta 34 (1989) 265-268.
3. A. Popov, N. Dimitrov, D. Kashchiev, T. Vitanov and E. Budevski: Electrochim. Acta 34 (1989) 269-271.
4. N. Dimitrov, A. Popov, D. Kashchiev, T. Vitanov and E. Budevski: Electrochim. Acta 36 (1991) 1259-1262.
5. D. Carnal, P. I. Orden, U. Muller, E. Schmidt and H. Siegenthaler: J. Electrochem. Acta 40 (1995) 1223-1235.
6. U. Schmidt, S. Vinzelberg and G. Staikov: Surf. Sci. 348 (1996) 261-279.
7. H. Siegenthaler, K. Jüttner, E. Schmidt and W. J. Lorentz: Electrochim. Acta 23 (1978) 1008-1018.
8. H. Bort, K. Juttner, W. J. Lorentz and G. Staikov: Electrochim. Acta 28 (1983) 993-1001.
9. E. Schmidt, M. Christen and P. Beyeler: J. Electroanal. Chem 42 (1973) 275-289.
10. Caroline M. Whelan, Malcolm R. Smyth, Colin J. Barnes, Gary A. Attard and Xiaofan Yang: J. Electroanal. Chem. 474 (1999) 138-146.
11. V. Rooryck, F. Reniers, C. Buess-Herman, G. A. Attard and X. Yang: J. Electroanal. Chem. 482 (2000) 93-101.
12. Da-ling Lu and Ken-ichi Tanaka: J. Electroanal. Chem. 430 (1997) 69-76.
13. H. Kawamura, M. Takahashi, N. Hojo, M. Miyake, K. Murase, K. Tamura, K. Uosaki, Y. Awakura, J. Mizuki and E. Matsubara: J. Electrochem. Soc. 149 (2002) C83-C88.
14. J. W. Sculutze, F. D. Koppitz and M. M. Lohrengel: Ber. Bunsen. Phys. Chem. 78 (1974) 693-701.
15. M. Z. Hassan, D. F. Untereker and Stanley Bruckenstein: J. Electroanal. Chem. 42 (1973) 161-181.
16. A. I. Danilov, J. E. T. Andersen, E. B. Molodkina, Yu. M. Polukarov, P. Møller and J. Ulstrup: J. Electrochem. Acta 43 (1997) 733-741.
17. A. Vaskevich, M. Rosenblum and E. Gileadi: J. Electroanal. Chem. 383 (1995) 167-174.
18. A. Vaskevich and E. Gileadi: J. Electroanal. Chem. 442 (1998) 147-150.
19. Y. Fujiwara: Thin Solod Films 425 (2003) 121-126.
20. R. Vidu and S. Hara: Surf. Sci. 452 (2000) 229-238.
21. R. Vidu and S. Hara: J. Electroanal. Chem. 475 (1999) 171-180.
22. R. Vidu, N. Hirai and S. Hara: Phys. Chem. Chem. Phys. 3 (2001) 3320-3324.
23. G. Inzelt, G. Horányi: J. Electroanal. Chem. 491 (2000) 111-116.
24. N. Hirai, K. Watanabe, A. Shiraki and S. Hara: J. Vac. Sci. Technol. B 18 (2000) 7-9.
25. N. Ikeyama, S. Miyaoka and S. Hara: Surf. Sci. 327 (1995) 261-273.
26. N. Nakajima, W. Sprengel and K. Nonaka: Intermetallics 4 (1996) S17-S28.