A fast method to measure the thickness of removed layer from etching of SSNTD based on EDXRF

Radiation Measurements

Volumn 36, Issue 1-6 SPEC., 2003, Pages 161-164

  Yip, C W Y ^a   Ho, J P Y ^a   Nikezic, D ^a   Yu, K N ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Bulk etch; CR 39; EDXRF; LR 115; SSNTD

Indexed keywords

ENERGY DISPERSIVE SPECTROSCOPY; ETCHING; FLUORESCENCE; X RAYS;

BULK ETCH;

RADIATION DETECTORS;

EID: 0037838376     PISSN: 13504487     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1350-4487(03)00115-X     Document Type: Conference Paper

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