Dry etching charactristic of LiNbO3 in plasma

IEEJ Transactions on Sensors and Micromachines

Volumn 118, Issue 9, 1998, Pages 425-430

  Ohta, Tomonari ^a   Matui, Riho ^a   Yoshikado, Shinzo ^a  

^a DOSHISHA UNIVERSITY   (Japan)

Author keywords

Ar; CF4; ECR; H2; LiNbO3; RIE

Indexed keywords

EID: 85010123858     PISSN: 13418939     EISSN: 13475525     Source Type: Journal    
DOI: 10.1541/ieejsmas.118.425     Document Type: Article

References (3)

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2. O. Mitomi, K. Noguchi, H. Miyazawa, “Design of Ultra-Broad- Band LINbO3 Optical Modulators with Ridge Structure”, IEEE Trans.onMicro. Tech., Vol. 43, No. 9, pp.2203-2207, 1995.
3. S. Matsui, T. Yamato, H. Aritome, S. Namba, “Microfabrication of LiNbO3 by Reactive Ion-Beam Etching”, J.J.Appl. Phys., Vol. 19, No. 8, pp.L463-L465, 1980.