Microwave ion sources for industrial applications (invited)

Review of Scientific Instruments

Volumn 71, Issue 2 II, 2000, Pages 1016-1022

  Sakudo, N ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0037790316     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1150376     Document Type: Article

References (23)

1. R. Geller, Appl. Phys. Lett. 16, 401 (1970).
2. Y. Okamoto and H. Tamagawa, Rev. Sci. Instrum. 43, 1193 (1972).
3. R. Geller, IEEE Trans. Nucl. Sci. NS-23, 904 (1976).
4. I. Brown, The Physics and Technology of Ion Sources (Wiley, New York, 1988).
5. J. F. Ziegler, Ion Implantation - Science and Technology (Poughkeepsie, New York, 1996).
6. J. H. Freeman, in Electromagnetic Separation of Radio Isotopes, edited by M. J. Higatsberger and F. P. Viehbock (Springer, Vienna, 1961), p. 204.
7. P. H. Rose, Rev. Sci. Instrum. 61, 342 (1990).
8. R. Bernas and O. Nier, Rev. Sci. Instrum. 19, 895 (1948).
9. N. Sakudo, K. Tokiguchi, H. Koike, and I. Kanomata, Rev. Sci. Instrum. 49, 940 (1978).
10. N. Sakudo, Nucl. Instrum. Methods Phys. Res. B 21, 168 (1987).
11. H. Ito, S. Ito, M. Takahashi, N. Sakudo, A. Kawasaki, and N. Ikenaga, Rev. Sci. Instrum. (these proceedings).
12. Y. Torii, M. Shimada, and I. Watanabe, Nucl. Instrum. Methods Phys. Res. B 21, 187 (1987).
13. K. Tokiguchi, T. Seki, K. Amemiya, and Y. Yamashita, Ion Implantation Technology 96, 287 (1997).
14. T. H. Stix, The Theory of Plasma Waves (McGraw-Hill, New York, 1962), p. 32.
15. J. Musil, F. Zacek, and V. N. Budnikov, Czech. J. Phys., Sect. B 23, 736 (1973).
16. M. A. Heald and C. B. Wharton, Plasma Diagnostics with Microwaves (Wiley, New York, 1965).
17. J. Musil and F. Zacek, "Experimental study of the absorption of intense electromagnetic waves in a magnetoactive plasma," Research Report of Institute of Plasma Physics Czechoslovak Academy of Science IPPCZ-180, p. 16 (1973).
18. V. Kopecky, J. Musil, and F. Zacek, Plasma Phys. 17, 1147 (1975).
19. N. Sakudo, K. Tokiguchi, H. Koike, and I. Kanomata, Rev. Sci. Instrum. 48, 762 (1977).
20. N. Sakudo, K. Tokiguchi, and H. Koike, Rev. Sci. Instrum. 54, 681 (1983).
21. Tera Analysis, Quick Field, CA, USA (1995).
22. H. Ito and N. Sakudo, "High frequency ion sources for ion implanters-Theoretical and practical comparison," Proceedings of the 11th International Conference on Ion Implantation Technology, Austin, TX, 1996, p. 291.
23. F. Le Coeur, T. Lagarde, J. Pelletier, Y. Arnal, R. Burke, and M. Brunei, Rev. Sci. Instrum. 69, 831 (1998).