High frequency ion sources for ion implanters - theoretical and practical comparison

Proceedings of the International Conference on Ion Implantation Technology

Volumn , Issue , 1996, Pages 291-294

  Ito, Hiroyuki ^a   Sakudo, Noriyuki ^a  

^a Applied Materials   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; ION SOURCES; MICROWAVES; PLASMA SOURCES; SEMICONDUCTOR DEVICE MANUFACTURE;

HIGH FREQUENCY ION SOURCES;

ION IMPLANTATION;

EID: 0030349380     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)