Effect of argon gas pressure and substrate temperature on magnetic properties of magnetron sputtered SmCo thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4936, Issue , 2002, Pages 394-402

  Wang, Yun H ^a   Sood, Dinesh K ^a   Ghantasala, Muralidhar K ^b  

^a RMIT UNIVERSITY   (Australia)

^b SWINBURNE UNIVERSITY OF TECHNOLOGY   (Australia)

Author keywords

Cr underlayer; Magnetic properties; Magnetron sputtering; SmCo thin films; Substrate temperature

Indexed keywords

COERCIVE FORCE; COMPOSITION; CRYSTALLINE MATERIALS; DEPOSITION; MAGNETRON SPUTTERING; MICROELECTROMECHANICAL DEVICES; SAMARIUM COMPOUNDS; SQUIDS;

GAS PRESSURE;

THIN FILMS;

EID: 0037740971     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.476346     Document Type: Conference Paper

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