Deposition of diamond-like carbon films by plasma source ion implantation with superposed pulse

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 708-711

  Baba, K ^a   Hatada, R ^a  

^a INDUSTRIAL TECHNOLOGY CENTER OF NAGASAKI   (Japan)

Author keywords

DLC; Hardness; PSII; Pulse bias

Indexed keywords

ELECTRIC POTENTIAL; HARDNESS; ION IMPLANTATION; PLASMA SOURCES; RAMAN SPECTROSCOPY; SILICON WAFERS;

PULSE VOLTAGES;

DIAMOND LIKE CARBON FILMS;

EID: 0037737550     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00841-3     Document Type: Conference Paper

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