Correlation between material properties and leakage currents in CVD diamond films deposited by DC plasma glow discharge

Materials Science and Engineering B

Volumn 47, Issue 1, 1997, Pages 54-63

  Bacci, T ^a   Borchi, E ^a,b   Bruzzi, M ^a,b   Santoro, M ^a   Sciortino, S ^a,b  

^a UNIVERSITY OF FLORENCE   (Italy)

^b INFN SEZIONE DI FIRENZE   (Italy)

Author keywords

Chemical vapor deposition; Leakage current level; Non diamond phases; Raman scattering; SEM analysis

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; ELECTROCHEMICAL ELECTRODES; GLOW DISCHARGES; HYDROGEN; LEAKAGE CURRENTS; MATHEMATICAL MODELS; METHANE; PLASMA APPLICATIONS; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; THERMAL EFFECTS;

DC PLASMA GLOW DISCHARGE; NONDIAMOND PHASES;

DIAMOND FILMS;

EID: 0037710629     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5107(97)00002-0     Document Type: Article

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