Deposition of thick diamond films by pulsed d.c. glow discharge CVD

Diamond and Related Materials

Volumn 5, Issue 6-8, 1996, Pages 850-856

  Hartmann, P ^a   Haubner, R ^a   Lux, B ^a  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

d.c. glow discharge CVD; Deposition area; Pulsed plasma generator; Thick diamond films

Indexed keywords

EID: 0001145769     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00369-x     Document Type: Article

References (24)

1. S. Matsumoto, Y. Sato, M. Kamo and N. Setaka, Jpn. J. Appl. Phys., 21 (4) (1982) L183.
2. B. Lux and R. Haubner, in R.F. Davis (ed.), Diamond Films and Coatings, Noyes, Park Ridge, 1993, p. 184.
3. P.K. Bachmann, Adv. Mater., 2 (1990) 195.
4. P.K. Bachmann and W. van Enckevort, Diamond Relat. Mater., 1 (1992) 1021.
5. K. Suzuki, A. Sawabe, H. Yasuda and T. Inuzuka, Appl. Phys. Lett., 50 (12) (1987) 728.
6. A. Sawabe, H. Yasuda and T. Inuzuka, Appl. Surf. Sci., 33/34 (1988) 539.
7. K. Suzuki, A. Sawabe and T. Inuzuka, Jpn. J. Appl. Phys., 29 (1) (1990) 153.
8. W. Wang, K. Liao and J. Gao, Phys. Status Solidi A, 126 (1991) K115.
9. W. Wang, J. Gao and K. Liao, Chinese Phys. Lett., 9 (8) (1992) 444.
10. S. Koizumi, T. Murakami, T. Inuzuka and K. Suzuki, Appl. Phys. Lett., 57 (6) (1990) 563.
11. T. Inuzuka, S. Koizumi and K. Suzuki, Diamond Relat. Mater., 1 (1992) 175.
12. W. Wang, K. Liao and J. Gao, Phys. Status Solidi A, 128 (1991) K83.
13. S. Nakao, S. Maruno, M. Noda, H. Kusakabe and H. Shimizu, J. Cryst. Growth, 99 (1990) 1215.
14. M. Nesládek, Diamond Relat. Mater., 2 (1993) 357.
15. W. Weizel and G. Albrecht, Forschungsberichte des Landes Nordrhein-Westfalen, 853 (1960).
16. V. Böhm, V. Buck, M. Liesenfeld, T. Naubert and J. Zeng, Diamond Relat Mater., 4 (1994) 33.
17. A. Mizuno, K. Okazaki, T. Takekoshi and R. Tobe, IEEE Trans. Ind. Appl., 29 (3) (1993) 656.
18. W. Weizel and F. Laube, Forschungsberichte des Landes Nordrhein-Westfalen, 857 (1960).
19. J.S. Kim, M.H. Kim, S.S. Park and J.Y. Lee, J. Appl. Phys., 67 (7) (1990) 3354.
20. K. Kobashi, K. Nishimura, Y. Kawate and T. Horiuchi, Phys. Rev. B, 38 (6) (1988) 4067.
21. Y. Sato and M. Kamo, Surf. Coat. Technol., 39/40 (1989) 183.
22. C. Wild, P. Koidl, W. Müller-Sebert, H. Walcher, R. Kohl, N. Herres and R. Locher, Diamond Relat. Mater., 2 (1993) 158.
23. W. Wang, K. Liao, J. Gao and A. Liu, Thin Solid Films, 215 (1992) 174.
24. R.J. Nemanich, J.T. Glass, G. Lukovsky and R.E. Shroder, J. Vac. Sci. Technol. A, 6 (3) (1988) 1783.